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Documentation updates for NIRSpec MOS/FS
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melanieclarke committed Jun 10, 2024
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15 changes: 11 additions & 4 deletions docs/jwst/exp_to_source/main.rst
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Expand Up @@ -34,14 +34,21 @@ configuration of MSA slitlets with a source assigned to each slitlet.
The source-to-slitlet linkage is carried along in the information contained
in the MSA metadata file used during :ref:`calwebb_spec2 <calwebb_spec2>`
processing. Each slitlet instance created by the :ref:`extract_2d <extract_2d_step>`
step stores the source ID (a simple integer number) in the SOURCEID keyword of
step stores the source name in the SRCNAME keyword of
the SCI extension header for the slitlet. The ``exp_to_source`` tool uses
the SOURCEID values to sort the data from each input product into an
the SRCNAME values to sort the data from each input product into an
appropriate source-based output product.

NIRSpec Fixed-Slit
If fixed slit targets are planned as part of a NIRSpec MOS exposure, they
will also have sources identified by the MSA metadata file. The associated
SRCNAME values are used to sort the data from these slits in the same way the
MSA slitlets are sorted. In this combined mode, the products containing
MOS slitlets are marked with EXP_TYPE = "NRS_MSASPEC" after sorting; the models
containing fixed slits are marked with EXP_TYPE = "NRS_FIXEDSLIT".

NIRSpec Fixed Slit
^^^^^^^^^^^^^^^^^^
NIRSpec fixed-slit observations do not have sources identified with each
NIRSpec fixed slit observations do not have sources identified with each
slit, so the slit names, e.g. S200A1, S1600A1, etc., are mapped to predefined
source ID values, as follows:

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4 changes: 2 additions & 2 deletions docs/jwst/flatfield/main.rst
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Expand Up @@ -104,7 +104,7 @@ is applied to the slit data, but that correction is not appropriate for the
background signal contained in the slit, and hence corrections must be
applied later in the :ref:`master background <master_background_step>` step.

So in this case the `flatfield` step will compute 2D arrays of conversion
In this case, the `flatfield` step will compute 2D arrays of conversion
factors that are appropriate for a uniform source and for a point source,
and store those correction factors in the "FLATFIELD_UN" and "FLATFIELD_PS"
extensions, respectively, of the output data product. The point source
Expand All @@ -118,7 +118,7 @@ wavelength-dependent. A uniform source does not require wavelength corrections
and hence the flatfield conversions will differ for point and uniform
sources. Any secondary slits that may be included in a fixed slit exposure
do not have source centering information available, so the
:ref:`wavecorr <wavecorr_step>` step is not applied, and hence there's no
:ref:`wavecorr <wavecorr_step>` step is not applied, and there is no
difference between the point source and uniform source flatfield
conversions for those slits.

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8 changes: 4 additions & 4 deletions docs/jwst/master_background/description.rst
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Expand Up @@ -295,9 +295,9 @@ source centering within the slit, hence slits containing uniform sources receive
the same flat-field and photometric calibrations as background spectra and
therefore don't require corrections for those two calibrations. Furthermore, the
source position in the slit is only known for the primary slit in an exposure, so
secondary slits are always handled as extended sources, and no wavelength correction is
applied, and therefore again the flat-field and photometric calibrations are
the same as for background spectra.
secondary slits are always handled as extended sources, no wavelength correction is
applied, and therefore again the flat-field, photometric, and pathloss calibrations
are the same as for background spectra.

Fixed slits planned as part of a combined MOS and FS observation are an
exception to this rule. These targets may each be identified as
Expand All @@ -306,7 +306,7 @@ point sources, with location information for each given in the
this way are treated in the same manner as the primary fixed slit in standard
FS observations.

Therefore if a fixed slit contains a point source (as given by the SRCTYPE keyword)
Therefore, if a fixed slit contains a point source (as given by the SRCTYPE keyword)
the corrections that need to be applied to the 2-D master background for that slit are:

.. math::
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4 changes: 4 additions & 0 deletions docs/jwst/nsclean/main.rst
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Expand Up @@ -103,6 +103,10 @@ processing MOS and IFU images. The masked region is currently hardwired
in the step to image indexes [1:2048, 923:1116], where the indexes are
in x, y order and in 1-indexed values.

Note, however, that it is possible to plan one or more fixed slit targets
alongside MSA slitlets in MOS observations. In this situation, the fixed
slit region is not automatically masked.

Left/Right Reference Pixel Columns
----------------------------------
Full-frame images contain 4 columns of reference pixels on the left and
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8 changes: 4 additions & 4 deletions docs/jwst/photom/main.rst
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Expand Up @@ -84,9 +84,9 @@ conversion factor. If the time-dependent coefficients are present in the
reference file, the photom step will apply the correction based on the
observation date of the exposure being processed.

NIRSpec Fixed-Slit Primary Slit
NIRSpec Fixed Slit Primary Slit
^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^
The primary slit in a NIRSpec fixed-slit exposure receives special handling.
The primary slit in a NIRSpec fixed slit exposure receives special handling.
If the primary slit, as given by the "FXD_SLIT" keyword value, contains a
point source, as given by the "SRCTYPE" keyword, it is necessary to know the
photometric conversion factors for both a point source and a uniform source
Expand All @@ -96,7 +96,7 @@ is applied to the slit data, but that correction is not appropriate for the
background signal contained in the slit, and hence corrections must be
applied later in the :ref:`master background <master_background_step>` step.

So in this case the `photom` step will compute 2D arrays of conversion
In this case, the `photom` step will compute 2D arrays of conversion
factors that are appropriate for a uniform source and for a point source,
and store those correction factors in the "PHOTOM_UN" and "PHOTOM_PS"
extensions, respectively, of the output data product. The point source
Expand All @@ -105,7 +105,7 @@ correction array is also applied to the slit data.
Note that this special handling is only needed when the slit contains a
point source, because in that case corrections to the wavelength grid are
applied by the :ref:`wavecorr <wavecorr_step>` step to account for any
source mis-centering in the slit and the photometric conversion factors are
source offsets in the slit and the photometric conversion factors are
wavelength-dependent. A uniform source does not require wavelength corrections
and hence the photometric conversions will differ for point and uniform
sources. Any secondary slits that may be included in a fixed-slit exposure
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16 changes: 16 additions & 0 deletions docs/jwst/pipeline/calwebb_spec3.rst
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Expand Up @@ -51,6 +51,9 @@ to observations of a moving target (TARGTYPE='moving').
:sup:`2`\ The master background subtraction step is applied to NIRSpec MOS
exposures in the :ref:`calwebb_spec2 <calwebb_spec2>` pipeline.

WFSS and SOSS Processing
------------------------

Notice that NIRCam and NIRISS WFSS, as well as NIRISS SOSS data, receive only minimal
processing by ``calwebb_spec3``.
WFSS 2D input data are reorganized into source-based products by the
Expand All @@ -66,6 +69,19 @@ obtained in TSO mode.
TSO mode NIRISS SOSS exposures should be processed with the
:ref:`calwebb_tso3 <calwebb_tso3>` pipeline.

Combined NIRSpec MOS and FS Exposures
-------------------------------------

It is possible to observe NIRSpec fixed slit targets alongside MSA
slitlets in NIRSpec MOS exposures. In this case, the input files produced by the
:ref:`calwebb_spec2 <calwebb_spec2>` pipeline contain both MOS and FS data. Any
:ref:`master_background <master_background_step>` corrections applied in this pipeline
will operate on the fixed slits only, since background corrections for MOS slitlets should
be applied in the :ref:`calwebb_spec2 <calwebb_spec2>` pipeline. After the sources are
separated in the :ref:`exp_to_source <exp_to_source>` step, each data product will contain
only a fixed slit or a MOS target, so all further processing follows the standard flow
for each exposure type.

Arguments
---------

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